Exposure method for photosensitive substrate

The invention discloses an exposure method for a photosensitive substrate. The exposure method comprises the following steps: firstly, a planar luminous source is provided; the planar luminous source comprises at least three luminous bodies; a negative film is provided and faces an irradiating surfa...

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Bibliographische Detailangaben
Hauptverfasser:	ZHOU KUNLIN, HE LIKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention discloses an exposure method for a photosensitive substrate. The exposure method comprises the following steps: firstly, a planar luminous source is provided; the planar luminous source comprises at least three luminous bodies; a negative film is provided and faces an irradiating surface of the planar luminous source; the photosensitive substrate is provided, is attached to the negative film and faces the irradiating surface; the negative film is located between the irradiating surface and the photosensitive substrate; and the planar luminous source carries out a translation relative to the negative film and the photosensitive substrate on the plane, or the negative film and the photosensitive substrate carries out the translation relative to the planar luminous source on the plane. Therefore, according to the exposure method for photosensitive substrate disclosed by the invention, the photosensitive substrate can be evenly exposed.