Template for self assembly and method of making a self assembled pattern

Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern.

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Bibliographische Detailangaben
Hauptverfasser:	LIN GUANYANG, WU HENGPENG, MIYAZAKI SHINJI, WAN JINGXIU, KIM JIHOON
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern.