Vacuum evaporation apparatus

This invention provides a vacuum evaporation apparatus. A material supplier (3) supplies evaporation material to an evaporation container (1) for forming a thin film on a substrate (K). The material supplier (3) comprises: a material filling container (11) filled with an evaporation material; a mate...

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Bibliographische Detailangaben
Hauptverfasser:	SENJU NAOKI, DAIKU HIROYUKI, MATSUMOTO YUJI, KANENOBU MARIKO, FUJIMOTO EISHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	This invention provides a vacuum evaporation apparatus. A material supplier (3) supplies evaporation material to an evaporation container (1) for forming a thin film on a substrate (K). The material supplier (3) comprises: a material filling container (11) filled with an evaporation material; a material guide channel (12) for guiding the evaporation material from the material filling container (11) toward the evaporation container (1) by using inertia gas supplied by a gas supplier (14); a heater (17) for heating the material guide channel (12) to gasify the evaporation material; and a vibration provider (13) for providing vibration to the material filling container (11).