Ion implanter

An ion implanter comprises an ion source and at least one optical assembly. The ion source provides an ion beam; the optical assembly is set on the transmission path of the ion beam to adjust the ion beam into an unparallel ion beam; in this way, different parts of the unparallel ion beam are used to conduct ion implanting in different areas of a workpiece at the same time. The optical assembly can be a magnetic assembly, like magnetic quadrupole moment or multiple coils set respectively on two separated supports. The optical assembly can also be an electrical component, like multiple electrodes set respectively on two separated supports. Different optical assemblies can be used to make the ion beam divergent or convergent so as to adjust the ion beam provided by the ion source into unparallel ion beam that has a low parallel degree.