Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same
The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent...
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| creator | KIM, SANG-TAE JEON, HYUN-SU KIM, HYOUN-WOO CHOI, HAN-YOUNG CHO, SEONG-BAE |
| description | The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same. |
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The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FREQUENCY-CHANGING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-LINEAR OPTICS ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160127&DB=EPODOC&CC=CN&NR=105274525A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160127&DB=EPODOC&CC=CN&NR=105274525A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, SANG-TAE</creatorcontrib><creatorcontrib>JEON, HYUN-SU</creatorcontrib><creatorcontrib>KIM, HYOUN-WOO</creatorcontrib><creatorcontrib>CHOI, HAN-YOUNG</creatorcontrib><creatorcontrib>CHO, SEONG-BAE</creatorcontrib><title>Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same</title><description>The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FREQUENCY-CHANGING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-LINEAR OPTICS</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyz0OwjAMhuEuDAi4gzkAEhQqZlQVMTGxVyZxaaQkDrEz9Pb8iAMwfe_wfPMqd2pGFx8g7Is6jmA4JBb3bYwWAsYyoNGSPyyQjmyBB8CccQIpd9GMSjBwBu-exVkweRJFD9ZJ8m9U5HPVkUAw0LKaDeiFVr9dVOtzd2svG0rckyQ0FEn79rrbNvXx0NTNaf-PeQGEIUT3</recordid><startdate>20160127</startdate><enddate>20160127</enddate><creator>KIM, SANG-TAE</creator><creator>JEON, HYUN-SU</creator><creator>KIM, HYOUN-WOO</creator><creator>CHOI, HAN-YOUNG</creator><creator>CHO, SEONG-BAE</creator><scope>EVB</scope></search><sort><creationdate>20160127</creationdate><title>Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same</title><author>KIM, SANG-TAE ; JEON, HYUN-SU ; KIM, HYOUN-WOO ; CHOI, HAN-YOUNG ; CHO, SEONG-BAE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN105274525A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FREQUENCY-CHANGING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-LINEAR OPTICS</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, SANG-TAE</creatorcontrib><creatorcontrib>JEON, HYUN-SU</creatorcontrib><creatorcontrib>KIM, HYOUN-WOO</creatorcontrib><creatorcontrib>CHOI, HAN-YOUNG</creatorcontrib><creatorcontrib>CHO, SEONG-BAE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, SANG-TAE</au><au>JEON, HYUN-SU</au><au>KIM, HYOUN-WOO</au><au>CHOI, HAN-YOUNG</au><au>CHO, SEONG-BAE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same</title><date>2016-01-27</date><risdate>2016</risdate><abstract>The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL FREQUENCY-CHANGING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-LINEAR OPTICS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same |
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