Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same

The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent...

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Bibliographische Detailangaben
Hauptverfasser: KIM, SANG-TAE, JEON, HYUN-SU, KIM, HYOUN-WOO, CHOI, HAN-YOUNG, CHO, SEONG-BAE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same.