Etching solution composition and manufacturing method of array substrate for liquid crystal display using the same
The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent...
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Zusammenfassung: | The invention discloses an etching solution composition, which comprises a metal layer oxidizing agent, a fluorine compound, a chelating agent and water as the balance. The chelating agent contains specific repetitive units. Meanwhile, for 1g of the etching solution composition, the chelating agent contains 0.6 mmol to 2 mmol of repetitive units. The invention also provides a manufacturing method of an array substrate for a liquid crystal display using the same. |
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