Single-room multi-electrode type PECVD (plasma enhanced chemical vapor deposition) reaction chamber

The invention provides a single-room multi-electrode type PECVD (plasma enhanced chemical vapor deposition) reaction chamber which comprises a vacuum chamber, wherein the vacuum chamber is externally connected with a vacuum gas exhaustion system and a vacuum detection system; a series of grounding electrode boards, high-frequency electrode boards and substrate racks for placing substrates, which are alternatively arranged, are arranged inside the vacuum chamber; in order to guarantee the film layer quality, a reaction gas uniform distribution device and a substrate heater are arranged in the vacuum chamber; and the types of reaction gases are determined by a film coating process. The single-room multi-electrode type PECVD reaction chamber adopts a multi-electrode structure, effectively improves the PECVD film coating efficiency and sufficiently considers various factors that affect the PECVD film forming quality. Besides, by virtue of an integrated design, the substrate racks and the gas distribution system are respectively integrated on the electrode boards, so that the structure of the reaction chamber is greatly simplified while requirements of the PECVD film coating process are met.