Arrangement pattern design method, light guide plate production method, production method for surface light source device, and production method for transmissive image display device

The purpose of the present invention is to provide an arrangement pattern design method for light scattering dots whereby irregularities in the pattern of the light scattering dots are less likely to occur. An arrangement pattern design method according to one embodiment is an arrangement pattern design method for a plurality of light scattering dots on a light guide plate, and involves a step (S11) for dividing the dot formation surface of a light guide plate substrate into a plurality of virtual regions and setting the coverage ratio for each virtual region, a step (S12) for setting, for each virtual region, a plurality of virtual cells for the purpose of forming light scattering dots, a step (S13) for arranging virtual light scattering dots in the virtual cells to prepare an initial arrangement pattern for the virtual light scattering dots such that the coverage ratio is satisfied for each virtual region, and a step (S14) for applying an error diffusion method to the initial arrangement pattern and thereby discretizing the sizes of the virtual light scattering dots forming the initial arrangement pattern into a plurality of size levels to prepare an arrangement pattern for light scattering dot formation.