Method of manufacturing 0.1THz ridged horn antenna by using focused ion beam and MEMS technology

The invention discloses a method of manufacturing a 0.1THz ridged horn antenna by using a focused ion beam and MEMS technology, which is applicable to the field of THz communication. The structural design advantages are as follows: 1) through processing by MEMS bulk silicon technology, a horn antenna with a micron size is obtained, and limits of the traditional technology are broken; 2) the technology is characterized by parallel processing, thereby greatly reducing the processing cost; 3) through glue spraying and photoetching, a region on the front face in no need of electroplating is protected, thereby effectively avoiding interference on antenna performance by the metal; 3) through design of a positioning groove, connection of a subsequent test interface is facilitated; and through etching of the focused ion beam, various ridged structures are manufactured on the inner wall of the horn. The antenna performance can be effectively adjusted, and applicability is expanded.