Method for improving registration accuracy

The invention relates to the technical field of semiconductor manufacturing, in particular to a method for improving registration accuracy. An actual pattern of an internal registration structure of a chip is obtained by electron beam scanning and is analyzed to obtain a registration offset of the a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	FENG YAOBIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention relates to the technical field of semiconductor manufacturing, in particular to a method for improving registration accuracy. An actual pattern of an internal registration structure of a chip is obtained by electron beam scanning and is analyzed to obtain a registration offset of the actual pattern; data are modeled to generate a novel exposure compensation program; and a photoetching technique is carried out on the chip by a photoetching machine by virtue of the novel exposure compensation program, so that the registration accuracy of a semiconductor product is improved; and meanwhile, the yield of the semiconductor product is improved.