Cleaning method and system of chemical material device and chemical material device with automatic cleaning function

The invention discloses a cleaning method and system of a chemical material device and a chemical material device with the automatic cleaning function. The cleaning method of the chemical material device comprises the following steps: receiving a cleaning instruction inputted by a user; sending starting instructions to a steam control valve, a first control valve and a second control valve, wherein the first control valve and the second control valve are correspondingly arranged at two ends of a chemical material pipeline; sending closing instructions to the first control valve and the second control valve after a first preset time is reached; sending an opening instruction to a cleaning liquid control valve; sending the closing instruction to the cleaning liquid control valve after preset conditions are reached. With the adoption of the cleaning method and system of the chemical material device, the chemical material device with the automatic cleaning function can automatically, quickly and efficiently remove material residues of the previous production in the chemical material device, so that the accuracy of a mixture prepared by mixing various chemical materials in the next production can be ensured, and as a result, the process accuracy and product quality can be ensured, and the production efficiency can be greatly improved.