Manufacturing method for color filter and display apparatus

The invention discloses a manufacturing method for a color filer, at least comprising the following steps: a substrate with a first surface and an image capture apparatus are provided; and a black matrix is formed on the first surface, and the first surface is spaced into a plurality of pixel region...

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Bibliographische Detailangaben
Hauptverfasser:	GUO ZHIYONG, WANG SHIMIN, LI SHAOZONG, ZHU ZELI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	The invention discloses a manufacturing method for a color filer, at least comprising the following steps: a substrate with a first surface and an image capture apparatus are provided; and a black matrix is formed on the first surface, and the first surface is spaced into a plurality of pixel regions by the black matrix; each pixel region at least comprises a first sub pixel region; the first sub pixel region is provided with a first graph; a first filter layer is formed on the first surface; the first filter layer at least covers the first sub pixel region; and the image capture apparatus captures the first graph in the first sub pixel region, and performs a first patterning process according to the first graph so as to form a first filter layer graphic pattern.