Impedance matching method of pulse RF power supply and matching method of plasma equipment

The invention relates to an impedance matching method of a pulse RF power supply and a matching method of plasma equipment. The impedance matching method of the pulse RF power supply comprises a step of (S1) setting an impedance adjusting element at a preset value and setting the pulse frequency of the pulse RF power supply as a preset pulse frequency, (S2) judging whether the preset pulse frequency is larger than a pulse threshold frequency or not, and going to (S3) if so, (S3) allowing the pulse frequency of the RF power supply to be equal to the pulse threshold frequency, starting the pulse RF power supply, realizing sweep frequency matching under an automatic RF sweep frequency function, and switching the pulse frequency of the pulse RF power supply as a preset pulse frequency after matching, (S4) starting the pulse RF power supply, and realizing sweep frequency matching under the automatic RF sweep frequency function. According to the impedance matching method of the pulse RF power supply, the difficulty of realizing impedance matching by the RF power supply can be reduced, thus the matching precision and matching stability of the pulse RF power supply can be improved, and thus the stability of the process is improved.