Special treatment system and treatment method for leaching waste water containing silane waste gas in polysilicon production
The invention provides a special treatment system and treatment method for leaching waste water containing silane waste gas in polysilicon production. The method is as below: conducting primary adjustment on waste water in a sewage adjustment tank, sending the waste water to a sludge pond for a firs...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The invention provides a special treatment system and treatment method for leaching waste water containing silane waste gas in polysilicon production. The method is as below: conducting primary adjustment on waste water in a sewage adjustment tank, sending the waste water to a sludge pond for a first neutralization, conducting a first press filtration in a filter press, the sending the filtrate into a neutralization tank for a second neutralization, conducting a second filtration in a filter, and discharging the filtrate. The system can achieve standard treatment of silane gas leaching wastewater containing chlorine, ensure that the suspension concentration in the supernatant of less than 10mg/L, pH value at 6-9, meet environmental requirements, and achieve standard discharge. |
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