Method evaluating black fungus mycelium high temperature resistance feature

The invention discloses a method evaluating a black fungus mycelium high temperature resistance feature and relates to an evaluating method for a black fungus high temperature resistance feature. The method is to provide a method with high feasibility and capable of simply and quickly identifying and affirming black fungus types whether to have a high-temperature resistant feature. The evaluating method comprises the following steps of (1) manufacturing a panel or an inclined surface via cPDA culture medium, (2) introducing black fungus into the cPDA inclined surface or the cPDA panel and culturing the black fungus for 96 hours at the temperature of 25 DEG C, (3) placing the black fungus at the temperature of 60 DEG C and conducting heat shock to the black fungus for 2 hours, and (4) placing the black fungus at the temperature of 25 DEG C. The mycelium continues to grow or restore growth and then the black fungus mycelium high temperature resistance feature is affirmed. The method is applied to evaluation of the black fungus high temperature resistance feature.