Marking method for TEM chip sample

The invention provides a marking method for a TEM chip sample. The portion, 0.2 micrometer-0.3 micrometer away from an object region, of the chip sample is damaged with a TEM to form an amorphous ring, and the radius of the amorphous ring is smaller than the distance between the amorphous ring and the object region. According to the marking method for the TEM chip sample, the portion nearby the object region needing to be observed with the transmission electron microscope is damaged, due to the fact that electron beams in the TEM are used, the position and radius of the amorphous ring formed by the damages can be precisely controlled, the accidental damage rate of the object region can be decreased, and a damage marker can be formed at the position under the object region, so that when the TEM chip sample is observed and analyzed with the transmission electron microscope, the object region needing to be observed and analyzed can be immediately found out, the time wasted for searching the object region is shortened when the TEM chip sample is observed and analyzed, and the working efficiency is improved.