Sheet of semiconducting material, system for forming same, and method of forming same

A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable o...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BLANDING DOUGLASS LANE, SONI KAMAL KISHORE, MAZUMDER PRANTIK, BISWAS SAMIR, COOK GLEN BENNETT, SUMAN BALRAM
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator BLANDING DOUGLASS LANE
SONI KAMAL KISHORE
MAZUMDER PRANTIK
BISWAS SAMIR
COOK GLEN BENNETT
SUMAN BALRAM
description A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN105121714A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN105121714A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN105121714A3</originalsourceid><addsrcrecordid>eNrjZAgNzkhNLVHIT1MoTs3NTM7PSylNLsnMS1fITSxJLcpMzNFRKK4sLknNVUjLLwLhXJBkcWJuqo5CYl6KQm5qSUZ-Ckg_shwPA2taYk5xKi-U5mZQdHMNcfbQTS3Ij08tLkhMTs1LLYl39jM0MDU0MjQ3NHE0JkYNAKcTOJ4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Sheet of semiconducting material, system for forming same, and method of forming same</title><source>esp@cenet</source><creator>BLANDING DOUGLASS LANE ; SONI KAMAL KISHORE ; MAZUMDER PRANTIK ; BISWAS SAMIR ; COOK GLEN BENNETT ; SUMAN BALRAM</creator><creatorcontrib>BLANDING DOUGLASS LANE ; SONI KAMAL KISHORE ; MAZUMDER PRANTIK ; BISWAS SAMIR ; COOK GLEN BENNETT ; SUMAN BALRAM</creatorcontrib><description>A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.</description><language>eng</language><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ; APPARATUS THEREFOR ; CHEMISTRY ; CRYSTAL GROWTH ; METALLURGY ; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; REFINING BY ZONE-MELTING OF MATERIAL ; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; SINGLE-CRYSTAL-GROWTH ; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151202&amp;DB=EPODOC&amp;CC=CN&amp;NR=105121714A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151202&amp;DB=EPODOC&amp;CC=CN&amp;NR=105121714A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BLANDING DOUGLASS LANE</creatorcontrib><creatorcontrib>SONI KAMAL KISHORE</creatorcontrib><creatorcontrib>MAZUMDER PRANTIK</creatorcontrib><creatorcontrib>BISWAS SAMIR</creatorcontrib><creatorcontrib>COOK GLEN BENNETT</creatorcontrib><creatorcontrib>SUMAN BALRAM</creatorcontrib><title>Sheet of semiconducting material, system for forming same, and method of forming same</title><description>A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.</description><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</subject><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>CRYSTAL GROWTH</subject><subject>METALLURGY</subject><subject>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>REFINING BY ZONE-MELTING OF MATERIAL</subject><subject>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>SINGLE-CRYSTAL-GROWTH</subject><subject>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgNzkhNLVHIT1MoTs3NTM7PSylNLsnMS1fITSxJLcpMzNFRKK4sLknNVUjLLwLhXJBkcWJuqo5CYl6KQm5qSUZ-Ckg_shwPA2taYk5xKi-U5mZQdHMNcfbQTS3Ij08tLkhMTs1LLYl39jM0MDU0MjQ3NHE0JkYNAKcTOJ4</recordid><startdate>20151202</startdate><enddate>20151202</enddate><creator>BLANDING DOUGLASS LANE</creator><creator>SONI KAMAL KISHORE</creator><creator>MAZUMDER PRANTIK</creator><creator>BISWAS SAMIR</creator><creator>COOK GLEN BENNETT</creator><creator>SUMAN BALRAM</creator><scope>EVB</scope></search><sort><creationdate>20151202</creationdate><title>Sheet of semiconducting material, system for forming same, and method of forming same</title><author>BLANDING DOUGLASS LANE ; SONI KAMAL KISHORE ; MAZUMDER PRANTIK ; BISWAS SAMIR ; COOK GLEN BENNETT ; SUMAN BALRAM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN105121714A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</topic><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>CRYSTAL GROWTH</topic><topic>METALLURGY</topic><topic>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>REFINING BY ZONE-MELTING OF MATERIAL</topic><topic>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>SINGLE-CRYSTAL-GROWTH</topic><topic>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</topic><toplevel>online_resources</toplevel><creatorcontrib>BLANDING DOUGLASS LANE</creatorcontrib><creatorcontrib>SONI KAMAL KISHORE</creatorcontrib><creatorcontrib>MAZUMDER PRANTIK</creatorcontrib><creatorcontrib>BISWAS SAMIR</creatorcontrib><creatorcontrib>COOK GLEN BENNETT</creatorcontrib><creatorcontrib>SUMAN BALRAM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BLANDING DOUGLASS LANE</au><au>SONI KAMAL KISHORE</au><au>MAZUMDER PRANTIK</au><au>BISWAS SAMIR</au><au>COOK GLEN BENNETT</au><au>SUMAN BALRAM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Sheet of semiconducting material, system for forming same, and method of forming same</title><date>2015-12-02</date><risdate>2015</risdate><abstract>A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_CN105121714A
source esp@cenet
subjects AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
CHEMISTRY
CRYSTAL GROWTH
METALLURGY
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
title Sheet of semiconducting material, system for forming same, and method of forming same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-31T23%3A25%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BLANDING%20DOUGLASS%20LANE&rft.date=2015-12-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN105121714A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true