Ito patterning device and patterning method

An ITO patterning device and a patterning method are disclosed. An ITO patterning method according to an aspect of the present invention comprises the steps of: forming an amorphous ITO layer on film or glass; forming a portion, which is to be formed as an ITO pattern, as polycrystalline ITO by part...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK BYEONG KYU, KIM SU CHAN, LEE CHAN KOO, BAE HYUN SEOP, KIM YOUNG WON
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
Online-Zugang:	Volltext bestellen
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