Exposure optics, exposure head, and exposure device

Provided are: exposure optics provided with a microlens array that corrects aberrations in focusing optics; an exposure head; and an exposure device. These exposure optics (100) are provided with the following: a spatial light-modulation element (34) containing an array of pixel units (74) that modu...

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Bibliographische Detailangaben
1. Verfasser:	KOMORI KAZUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Provided are: exposure optics provided with a microlens array that corrects aberrations in focusing optics; an exposure head; and an exposure device. These exposure optics (100) are provided with the following: a spatial light-modulation element (34) containing an array of pixel units (74) that modulate light (B) from a light source; a microlens array (64) in which microlenses (64a) that concentrate the light modulated by the spatial light-modulation element (34) are arrayed in a single plane; first focusing optics (52) that focus the light (B) modulated by the spatial light-modulation element (34) onto the microlens array (64); and second focusing optics (58) that focus the light (B) concentrated by the microlens array (64) onto a photosensitive material (P). The microlens array (64) contains a plurality of types of microlenses (64a) that have different shapes in accordance with the distances thereof from the optical axis (58c) of the second focusing optics (58).