Low-temperature film coating method using tetraethyl orthosilicate (TEOS) source

The invention discloses a low-temperature film coating method using a tetraethyl orthosilicate (TEOS) source, and provides a method with plasma enhanced chemical vapor deposition as a low-temperature deposition insulation layer mainly in order to meet the requirement that the deposition temperature...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIU JINGJING, CHANG XIAONA, DU YUANTING, WU WEI, LI JING, SHANG QINGYAN, YU PENG
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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