Manufacturing method of high aspect ratio flexible nanopillar array

The invention belongs to the field of integrated circuit and micro nano electronic mechanical system manufacturing, and specifically relates to a manufacturing method of a high aspect ratio flexible nanopillar array. The manufacturing method comprises preparing a soft template of a high aspect ratio...

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Bibliographische Detailangaben
Hauptverfasser:	MENG HAISHA, YUAN WEIZHENG, QIAO DAYONG, MA ZHIBO, JIANG CHENGYU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention belongs to the field of integrated circuit and micro nano electronic mechanical system manufacturing, and specifically relates to a manufacturing method of a high aspect ratio flexible nanopillar array. The manufacturing method comprises preparing a soft template of a high aspect ratio flexible nanometer cilia structure, wherein the soft template takes PDMS as the casting material; and copying a template of a high aspect ratio flexible nanometer cilia array, wherein the imprinted PDMS is used as a template, and ultraviolet light polymerization adhesive OrmoStamp materials are imprinted to obtain a flexible structure which is identical to the flexible structure on the silicon die. For the difficulty in manufacturing a high aspect ratio flexible nanometer structure, the manufacturing method of a high aspect ratio flexible nanopillar array can realize flexible manufacturing of a high aspect ratio flexible nanometer cilia array through the method of imprinting twice and provide important technical support for manufacturing the high aspect ratio flexible nanometer structure, based on two flexible materials: PDMS and ultraviolet light polymerization adhesive OrmoStamp.