Optical proximity effect correction method aiming at specific repeated patterns
The invention provides an optical proximity effect correction method aiming at specific repeated patterns. The method comprises the following steps: dividing a whole layout to be corrected into a specific repeated pattern area and a nonspecific repeated pattern area, wherein the specific repeated pa...
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| creator | ZHU JUN LYU YUKUN ZHANG XUSHENG QI XUERUI WEI FANG |
| description | The invention provides an optical proximity effect correction method aiming at specific repeated patterns. The method comprises the following steps: dividing a whole layout to be corrected into a specific repeated pattern area and a nonspecific repeated pattern area, wherein the specific repeated pattern area comprises repeated pattern basic units, and each repeated pattern basic unit comprises symmetric patterns and non-horizontal perpendicular edges; using a conventional optical proximity effect correction method to correct the nonspecific repeated pattern area to obtain a first correction result; using a limited optical proximity effect correction method to correct the specific repeated pattern area to obtain a second correction result; and finally splicing the first correction result and the second correction result together to obtain a pattern for manufacturing an optical cover. |
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The method comprises the following steps: dividing a whole layout to be corrected into a specific repeated pattern area and a nonspecific repeated pattern area, wherein the specific repeated pattern area comprises repeated pattern basic units, and each repeated pattern basic unit comprises symmetric patterns and non-horizontal perpendicular edges; using a conventional optical proximity effect correction method to correct the nonspecific repeated pattern area to obtain a first correction result; using a limited optical proximity effect correction method to correct the specific repeated pattern area to obtain a second correction result; and finally splicing the first correction result and the second correction result together to obtain a pattern for manufacturing an optical cover.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151021&DB=EPODOC&CC=CN&NR=104991415A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151021&DB=EPODOC&CC=CN&NR=104991415A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHU JUN</creatorcontrib><creatorcontrib>LYU YUKUN</creatorcontrib><creatorcontrib>ZHANG XUSHENG</creatorcontrib><creatorcontrib>QI XUERUI</creatorcontrib><creatorcontrib>WEI FANG</creatorcontrib><title>Optical proximity effect correction method aiming at specific repeated patterns</title><description>The invention provides an optical proximity effect correction method aiming at specific repeated patterns. 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The method comprises the following steps: dividing a whole layout to be corrected into a specific repeated pattern area and a nonspecific repeated pattern area, wherein the specific repeated pattern area comprises repeated pattern basic units, and each repeated pattern basic unit comprises symmetric patterns and non-horizontal perpendicular edges; using a conventional optical proximity effect correction method to correct the nonspecific repeated pattern area to obtain a first correction result; using a limited optical proximity effect correction method to correct the specific repeated pattern area to obtain a second correction result; and finally splicing the first correction result and the second correction result together to obtain a pattern for manufacturing an optical cover.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Optical proximity effect correction method aiming at specific repeated patterns |
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