Optical proximity effect correction method aiming at specific repeated patterns

The invention provides an optical proximity effect correction method aiming at specific repeated patterns. The method comprises the following steps: dividing a whole layout to be corrected into a specific repeated pattern area and a nonspecific repeated pattern area, wherein the specific repeated pattern area comprises repeated pattern basic units, and each repeated pattern basic unit comprises symmetric patterns and non-horizontal perpendicular edges; using a conventional optical proximity effect correction method to correct the nonspecific repeated pattern area to obtain a first correction result; using a limited optical proximity effect correction method to correct the specific repeated pattern area to obtain a second correction result; and finally splicing the first correction result and the second correction result together to obtain a pattern for manufacturing an optical cover.