Manufacturing method for mask plate

Manufacturing method for mask plate

The invention relates to a manufacturing method for a mask plate. The manufacturing method comprises the following steps: forming a melting material layer on a base plate; aerating and developing the base plate provided with the melting material layer so as to form a picture region with an opening i...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GONG JIANGUO, RAN YINGGANG, WANG HONGYING, ZHOU YANGCHUAN, LI JIANHUA, SU JUNHAI, WU JUNXIONG, KE XIANJUN, MA DEGUI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator GONG JIANGUO
RAN YINGGANG
WANG HONGYING
ZHOU YANGCHUAN
LI JIANHUA
SU JUNHAI
WU JUNXIONG
KE XIANJUN
MA DEGUI
description The invention relates to a manufacturing method for a mask plate. The manufacturing method comprises the following steps: forming a melting material layer on a base plate; aerating and developing the base plate provided with the melting material layer so as to form a picture region with an opening in the melting material layer; forming a metal layer on the base plate provided with the melting material layer; and removing the melting material layer to separate the metal layer on the melting material layer from the base plate so as to obtain the mask plate. According to the mask plate, as an etching technology is not adopted, the production process is simple and the production cost is relatively low, and moreover, the precision of the mask can be relatively high, so that the mask plate can satisfy the demand of a high-resolution display screen.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN104979495A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN104979495A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN104979495A3</originalsourceid><addsrcrecordid>eNrjZFD2TcwrTUtMLiktysxLV8hNLcnIT1FIyy9SyE0szlYoyEksSeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGJpbmliaWpo7GxKgBAOg5Jog</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Manufacturing method for mask plate</title><source>esp@cenet</source><creator>GONG JIANGUO ; RAN YINGGANG ; WANG HONGYING ; ZHOU YANGCHUAN ; LI JIANHUA ; SU JUNHAI ; WU JUNXIONG ; KE XIANJUN ; MA DEGUI</creator><creatorcontrib>GONG JIANGUO ; RAN YINGGANG ; WANG HONGYING ; ZHOU YANGCHUAN ; LI JIANHUA ; SU JUNHAI ; WU JUNXIONG ; KE XIANJUN ; MA DEGUI</creatorcontrib><description>The invention relates to a manufacturing method for a mask plate. The manufacturing method comprises the following steps: forming a melting material layer on a base plate; aerating and developing the base plate provided with the melting material layer so as to form a picture region with an opening in the melting material layer; forming a metal layer on the base plate provided with the melting material layer; and removing the melting material layer to separate the metal layer on the melting material layer from the base plate so as to obtain the mask plate. According to the mask plate, as an etching technology is not adopted, the production process is simple and the production cost is relatively low, and moreover, the precision of the mask can be relatively high, so that the mask plate can satisfy the demand of a high-resolution display screen.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151014&amp;DB=EPODOC&amp;CC=CN&amp;NR=104979495A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151014&amp;DB=EPODOC&amp;CC=CN&amp;NR=104979495A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GONG JIANGUO</creatorcontrib><creatorcontrib>RAN YINGGANG</creatorcontrib><creatorcontrib>WANG HONGYING</creatorcontrib><creatorcontrib>ZHOU YANGCHUAN</creatorcontrib><creatorcontrib>LI JIANHUA</creatorcontrib><creatorcontrib>SU JUNHAI</creatorcontrib><creatorcontrib>WU JUNXIONG</creatorcontrib><creatorcontrib>KE XIANJUN</creatorcontrib><creatorcontrib>MA DEGUI</creatorcontrib><title>Manufacturing method for mask plate</title><description>The invention relates to a manufacturing method for a mask plate. The manufacturing method comprises the following steps: forming a melting material layer on a base plate; aerating and developing the base plate provided with the melting material layer so as to form a picture region with an opening in the melting material layer; forming a metal layer on the base plate provided with the melting material layer; and removing the melting material layer to separate the metal layer on the melting material layer from the base plate so as to obtain the mask plate. According to the mask plate, as an etching technology is not adopted, the production process is simple and the production cost is relatively low, and moreover, the precision of the mask can be relatively high, so that the mask plate can satisfy the demand of a high-resolution display screen.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD2TcwrTUtMLiktysxLV8hNLcnIT1FIyy9SyE0szlYoyEksSeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGJpbmliaWpo7GxKgBAOg5Jog</recordid><startdate>20151014</startdate><enddate>20151014</enddate><creator>GONG JIANGUO</creator><creator>RAN YINGGANG</creator><creator>WANG HONGYING</creator><creator>ZHOU YANGCHUAN</creator><creator>LI JIANHUA</creator><creator>SU JUNHAI</creator><creator>WU JUNXIONG</creator><creator>KE XIANJUN</creator><creator>MA DEGUI</creator><scope>EVB</scope></search><sort><creationdate>20151014</creationdate><title>Manufacturing method for mask plate</title><author>GONG JIANGUO ; RAN YINGGANG ; WANG HONGYING ; ZHOU YANGCHUAN ; LI JIANHUA ; SU JUNHAI ; WU JUNXIONG ; KE XIANJUN ; MA DEGUI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN104979495A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>GONG JIANGUO</creatorcontrib><creatorcontrib>RAN YINGGANG</creatorcontrib><creatorcontrib>WANG HONGYING</creatorcontrib><creatorcontrib>ZHOU YANGCHUAN</creatorcontrib><creatorcontrib>LI JIANHUA</creatorcontrib><creatorcontrib>SU JUNHAI</creatorcontrib><creatorcontrib>WU JUNXIONG</creatorcontrib><creatorcontrib>KE XIANJUN</creatorcontrib><creatorcontrib>MA DEGUI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GONG JIANGUO</au><au>RAN YINGGANG</au><au>WANG HONGYING</au><au>ZHOU YANGCHUAN</au><au>LI JIANHUA</au><au>SU JUNHAI</au><au>WU JUNXIONG</au><au>KE XIANJUN</au><au>MA DEGUI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Manufacturing method for mask plate</title><date>2015-10-14</date><risdate>2015</risdate><abstract>The invention relates to a manufacturing method for a mask plate. The manufacturing method comprises the following steps: forming a melting material layer on a base plate; aerating and developing the base plate provided with the melting material layer so as to form a picture region with an opening in the melting material layer; forming a metal layer on the base plate provided with the melting material layer; and removing the melting material layer to separate the metal layer on the melting material layer from the base plate so as to obtain the mask plate. According to the mask plate, as an etching technology is not adopted, the production process is simple and the production cost is relatively low, and moreover, the precision of the mask can be relatively high, so that the mask plate can satisfy the demand of a high-resolution display screen.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_CN104979495A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Manufacturing method for mask plate
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T16%3A10%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GONG%20JIANGUO&rft.date=2015-10-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN104979495A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true