Monolayer embossing pattern microstructural anti-counterfeiting mark

The invention relates to a microstructural anti-counterfeiting mark which has a dynamic effect and concealed property. Two or multiple groups of monolayer two-dimensional micro-image-text arrays which are identical or similar in cycle and identical or different in pattern are overlaid together, and the monolayer embossing pattern microstructural anti-counterfeiting mark is formed. By means of the monolayer embossing pattern microstructural anti-counterfeiting mark, images are not shown under the illumination of a common light fixture or the natural light, while micro-image-text structures which are amplified obviously and the dynamic effect can be observed under the illumination of hard light or a point light source, and the special anti-counterfeiting concealed property is achieved. The anti-counterfeiting mark is novel and unique in structure, diversified in product form and wide in application scope.