Apparatus for measuring thickness of a layer

The invention discloses a F thickness change measuring device and method detecting the thickness of a deposited film; a deposite device comprises the following elements: a chamber; a deposite source arranged in the chamber and providing deposite material so as to form the deposited film on a substra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WOO, BONG-JOO, LEE, SOON-JONG, WON, JUN-YEON
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	The invention discloses a F thickness change measuring device and method detecting the thickness of a deposited film; a deposite device comprises the following elements: a chamber; a deposite source arranged in the chamber and providing deposite material so as to form the deposited film on a substrate; a film thickness determination portion arranged in the chamber and supplied by part of the deposited material; a light output portion outputting light of different wavelengths to the thickness determination portion; a light detection portion detecting the film on the film thickness determination portion or reflection light reflected by the film thickness determination portion, or transmittance light penetrating the film thickness determination portion. The device and method can use the light with different wavelength to detect the thickness of the films on the thickness determination portion or shield, and uses the detected thickness to calculate the thickness of the deposited film on the substrate.