TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME
The present invention provides a novel tin or tin alloy electroplating bath, which can preferably be used for the production of bumps, and which has excellent recess filling property and can suppress the generation of voids.The electroplating bath includes an inorganic acid and an organic acid, as w...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | TSUJIMOTO,MASANOBU KANO,TOSHIKAZU IKUMOTO,RAIHEI |
description | The present invention provides a novel tin or tin alloy electroplating bath, which can preferably be used for the production of bumps, and which has excellent recess filling property and can suppress the generation of voids.The electroplating bath includes an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof; and leveling agents containing at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of [alpha],[beta]-unsaturated carboxylic acids, [alpha],[beta]-unsaturated carboxylic acid amides, and salts thereof. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN104928730A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN104928730A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN104928730A3</originalsourceid><addsrcrecordid>eNrjZPAP8fRT8A9SAFGOPj7-kQquPq7OIUH-AT6OQDF3BSfHEA8FRz8XhYAgf2fX4GAFN6BqINsl1BksHeobEKwQGgxiBzv6uvIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0MDE0sjC3NjA0djYtQAADGILqU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME</title><source>esp@cenet</source><creator>TSUJIMOTO,MASANOBU ; KANO,TOSHIKAZU ; IKUMOTO,RAIHEI</creator><creatorcontrib>TSUJIMOTO,MASANOBU ; KANO,TOSHIKAZU ; IKUMOTO,RAIHEI</creatorcontrib><description>The present invention provides a novel tin or tin alloy electroplating bath, which can preferably be used for the production of bumps, and which has excellent recess filling property and can suppress the generation of voids.The electroplating bath includes an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof; and leveling agents containing at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of [alpha],[beta]-unsaturated carboxylic acids, [alpha],[beta]-unsaturated carboxylic acid amides, and salts thereof.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150923&DB=EPODOC&CC=CN&NR=104928730A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150923&DB=EPODOC&CC=CN&NR=104928730A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSUJIMOTO,MASANOBU</creatorcontrib><creatorcontrib>KANO,TOSHIKAZU</creatorcontrib><creatorcontrib>IKUMOTO,RAIHEI</creatorcontrib><title>TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME</title><description>The present invention provides a novel tin or tin alloy electroplating bath, which can preferably be used for the production of bumps, and which has excellent recess filling property and can suppress the generation of voids.The electroplating bath includes an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof; and leveling agents containing at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of [alpha],[beta]-unsaturated carboxylic acids, [alpha],[beta]-unsaturated carboxylic acid amides, and salts thereof.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAP8fRT8A9SAFGOPj7-kQquPq7OIUH-AT6OQDF3BSfHEA8FRz8XhYAgf2fX4GAFN6BqINsl1BksHeobEKwQGgxiBzv6uvIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0MDE0sjC3NjA0djYtQAADGILqU</recordid><startdate>20150923</startdate><enddate>20150923</enddate><creator>TSUJIMOTO,MASANOBU</creator><creator>KANO,TOSHIKAZU</creator><creator>IKUMOTO,RAIHEI</creator><scope>EVB</scope></search><sort><creationdate>20150923</creationdate><title>TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME</title><author>TSUJIMOTO,MASANOBU ; KANO,TOSHIKAZU ; IKUMOTO,RAIHEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN104928730A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>TSUJIMOTO,MASANOBU</creatorcontrib><creatorcontrib>KANO,TOSHIKAZU</creatorcontrib><creatorcontrib>IKUMOTO,RAIHEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSUJIMOTO,MASANOBU</au><au>KANO,TOSHIKAZU</au><au>IKUMOTO,RAIHEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME</title><date>2015-09-23</date><risdate>2015</risdate><abstract>The present invention provides a novel tin or tin alloy electroplating bath, which can preferably be used for the production of bumps, and which has excellent recess filling property and can suppress the generation of voids.The electroplating bath includes an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof; and leveling agents containing at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of [alpha],[beta]-unsaturated carboxylic acids, [alpha],[beta]-unsaturated carboxylic acid amides, and salts thereof.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_CN104928730A |
source | esp@cenet |
subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T21%3A08%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TSUJIMOTO,MASANOBU&rft.date=2015-09-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN104928730A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |