Light-absorbing layer system, the production thereof and sputter target suitable therefor

A light-absorbing layer system comprising at least two layers is specified, one layer of which is an anti-reflection layer facing the observer which is made of a dielectric material and at least one further layer of which is an absorber layer facing away from the observer made of an oxide or an oxyn...

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Bibliographische Detailangaben
Hauptverfasser:	WAGNER JENS, SCHULTHEIS MARKUS, SCHNEIDER-BETZ SABINE, KASTNER ALBERT, SZYSZKA BERND, DEWALD WILMA, SCHLOTT MARTIN
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS RANGES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION VENTILATING WEAPONS
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Beschreibung
Zusammenfassung:	A light-absorbing layer system comprising at least two layers is specified, one layer of which is an anti-reflection layer facing the observer which is made of a dielectric material and at least one further layer of which is an absorber layer facing away from the observer made of an oxide or an oxynitride with an hypostoichiometric oxygen content. The layer system has a total visible transmission Tv in the wavelength range from 380 to 780 nm of less than 20%, a visible reflection Rv of less than 6% and has a layer resistance R of more than 10 k Ohm.