Pattern evaluation device and visual inspection device comprising pattern evaluation device

The invention provides a pattern evaluation device, which comprises a model estimating unit to estimate, from an inspection image, a model resulting from a manufacturing method, a deformation estimating unit to estimate the deformation of the inspection image using the estimated model, a reference d...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MINAKAWA TSUYOSHI, USHIBA HIROYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	The invention provides a pattern evaluation device, which comprises a model estimating unit to estimate, from an inspection image, a model resulting from a manufacturing method, a deformation estimating unit to estimate the deformation of the inspection image using the estimated model, a reference data deforming unit to deform reference data using the estimated deformation, and an evaluating unit to evaluate by comparing the reference data deformed by the reference data deforming unit and the inspection image.