Pretreatment method of glass substrate used for forming etching mask

The invention provides a pretreatment method of a glass substrate, which can rapidly strip an etching mask on the whole surface of a glass substrate, hardly leaving any stripping residues under the condition of performing etching processing and etching mask stripping after forming the etching mask o...

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1. Verfasser: UEMATSU TERUHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:The invention provides a pretreatment method of a glass substrate, which can rapidly strip an etching mask on the whole surface of a glass substrate, hardly leaving any stripping residues under the condition of performing etching processing and etching mask stripping after forming the etching mask on the glass substrate of a non-electric conductivity envelope having the surface provided with metal wires, and prepared by organic or inorganic materials. The invention also provides a method of forming an etching mask on a glass substrate implementing the pretreatment method, and a glass substrate helping etching processing method with an etching mask formed by the method. Before forming an etching mask on the glass substrate of a non-electric conductivity envelope having the surface provided with metal wires, and prepared by organic or inorganic materials, specified pro-liquefaction treatment, alkali metal removal treatment and hydrophobic treatment are respectively implemented to the glass substrate.