Synchronous scanning laser annealing device

The invention belongs to the field of semiconductor manufacturing equipment and technology, and particularly relates to a synchronous scanning laser annealing device. The device comprises laser light sources, and an electro-optic control unit, a collimation and beam expanding unit, a uniform light unit, a focusing unit and a workbench which are arranged on light paths in turn. The laser light sources are complete linearly polarized light. Synchronous control between the laser light sources and the workbench is performed via a synchronous board card. The electro-optic control unit controls passage or cut-off of the light beams of the laser light sources via electro-optic switching assemblies and synchronous signals. According to the technical scheme, the electro-optic switching assemblies are additionally arranged outside the laser device, and passage or cut-off of the light beams is controlled by utilizing the synchronous electro-optic switching assemblies in the scanning process so that annealing of a target region is realized. Defects in the prior art are avoided by the method, control is convenient without loss of the laser device, and intensity of annealing laser can be controlled via voltage so that adjustment of the size of annealing energy can be rapidly realized at millisecond level.