Silicon-doped diamond film on surface of spacecraft moving part and method for combining to surface of spacecraft moving part
The invention relates to a silicon-doped diamond film on surface of a spacecraft moving part and a method for combining to the surface of a spacecraft moving part, which belongs to the field of metal component surface protection material. The silicon-doped diamond film comprises a base layer, a grad...
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Sprache: | eng |
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Zusammenfassung: | The invention relates to a silicon-doped diamond film on surface of a spacecraft moving part and a method for combining to the surface of a spacecraft moving part, which belongs to the field of metal component surface protection material. The silicon-doped diamond film comprises a base layer, a gradient transition layer combined on the surface of the base layer, and a diamond-like carbon plated film layer combined on the surface of the gradient transition layer. The silicon-doped diamond film is characterized in that the base layer is a titanium layer, the gradient transition layer is the titanium and silicon gradient transition layer, and the diamond-like carbon plated film layer is the silicon-doped diamond film. The method comprises the following steps: performing ultrasonic cleaning on the surface of a matrix of the spacecraft moving part; introducing the obtained cleaning matrix in a vacuum sputtering film-plating machine for vacuum pumping under a heating state; performing bombardment cleaning on the surface of the cleaning matrix; depositing a titanium layer on the surface of the cleaning matrix; depositing the titanium and silicon gradient transition layer on the surface of the titanium layer; and forming the silicon-doped diamond film on the surface of the titanium and silicon gradient transition layer. The silicon-doped diamond film has the advantages of good lubrication and wear resistance performance, can increase the reliability and stability of movement as well as prolong the service life, and the method has the advantages of simple process and easy control of the technological parameter. |
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