Apparatus for treating ion beam
An ion beam scanning assembly (202, 300) includes a set of scanning electrodes (314a, 314b, 316a, 316b, 318) defining a gap (330) to accept an ion beam and scan the ion beam in a first plane (xz-plane), and a multipole electrostatic lens system comprising a plurality of electrodes (304, 306, 310, 31...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | An ion beam scanning assembly (202, 300) includes a set of scanning electrodes (314a, 314b, 316a, 316b, 318) defining a gap (330) to accept an ion beam and scan the ion beam in a first plane (xz-plane), and a multipole electrostatic lens system comprising a plurality of electrodes (304, 306, 310, 312) arranged along a portion of a path of travel of the ion beam bounded by the pair of scanning electrodes, the multipole electrostatic lens system configured to shape the ion beam in a direction (y) perpendicular to the first plane. |
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