Process for synthesizng reduced graphene oxide on substrate from seedlac

The present invention relates to synthesizing reduced graphene oxide on the surface of a metal sheet and glass. The invention particularly relates to a process for coating a substrate with reduced graphene oxide using seedlac as a carbon source. As per the process of the current invention, a solutio...

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Bibliographische Detailangaben
Hauptverfasser:	VIKAS CHANDRA SRIVASTAVA, ASHIT KUMAR PRAMANICK, YASHABANTA NARAYAN SINGHBABU, SHYAM KUMAR CHOUDHARY, TAPAN KUMAR ROUT, MANISH KUMAR BHADU, SUMITESH DAS, RANJAN KUMAR SAHU
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOUNDS THEREOF CORRECTING FLUIDS DYES FILLING PASTES INKS INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOTECHNOLOGY NATURAL RESINS NON-METALLIC ELEMENTS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	The present invention relates to synthesizing reduced graphene oxide on the surface of a metal sheet and glass. The invention particularly relates to a process for coating a substrate with reduced graphene oxide using seedlac as a carbon source. As per the process of the current invention, a solution of seedlac is prepared in an alcohol and the substrate is dipped in to the solution for one or more time. The substrate is then dried in air for 1-10 minutes and thereafter, heated to a temperature range of 400 to 1200 DEG C under controlled atmosphere of Ar/N2/Ar-H2/N2-H2 at a different flow rate ranging from 100 to 500 sccm for a period of 10 to 120 minutes.