Method for preparing monosilane using trialkoxysilane

The present invention relates to a method for preparing a monosilane, and more specifically, to a method for economically preparing a monosilane, which is useful for a composition of a thin semiconductor structure and a multipurpose high-purity polycrystalline silicon, by preparing a monosilane in h...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KHATAM ASHUROV, RUSTAM ASHUROV, KIM YONG-IL, KIM DEOK-YUN, KIM KYUNG-YEOL, SHAVKAT SALIKHOV, VLADIMIR ROTSHTEYN, SULTAN AZIZOV, ILYOS ABDISAIDOV, KIM TAEK-JOONG, KHEKAYAT ASHUROVA, AZIZ KURBANOV
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a method for preparing a monosilane, and more specifically, to a method for economically preparing a monosilane, which is useful for a composition of a thin semiconductor structure and a multipurpose high-purity polycrystalline silicon, by preparing a monosilane in high purity and yield using a trialkoxysilane.