Pulse sputtering power source
Disclosed is a pulse sputtering power source. The pulse sputtering power source comprises a three phase rectifying circuit, an inverse circuit, a high frequency transformer, a rectifying and filtering circuit and a pulse generation circuit, and is characterized by comprising a central processing uni...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed is a pulse sputtering power source. The pulse sputtering power source comprises a three phase rectifying circuit, an inverse circuit, a high frequency transformer, a rectifying and filtering circuit and a pulse generation circuit, and is characterized by comprising a central processing unit, a drive circuit, a signal collection module, a protection module, an upper computer, a liquid crystal display module and a signal input module, wherein the central processing unit is an ARM system, the signal collection module comprises a voltage sampling circuit and a current sampling circuit, and the protection module comprises an over current and short circuit protection circuit. The pulse sputtering power source solves the problem that power supply reliability is reduced due to the number of power switch tubes is large in the prior art, is good in dynamic performance, low in cost, and simple and reliable to control, and has energy feedback. The invention further discloses a control method based on the pulse sputtering power source. |
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