Different-space different-size substrate alignment method

The invention relates to a different-space different-size substrate alignment method, which comprises: capturing actual local images of two substrates with different sizes; comparing the particular labels of the two substrates within the standard local character regions, and acquiring the particular...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	YANG JUNMING, WEN ZHIQUN, LIN SHIWEI, LIN CHONGTIAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a different-space different-size substrate alignment method, which comprises: capturing actual local images of two substrates with different sizes; comparing the particular labels of the two substrates within the standard local character regions, and acquiring the particular labels of the two substrates within the actual local character regions; respectively establishing actual coordinate systems of the two substrates so as to synthesize an alignment assembly coordinate system; comparing the coordinate values of the particular labels of the two substrates within the two actual coordinate systems so as to acquire a first group of offsets, and comparing the sizes of the two substrates so as to obtain the size difference; using the first group of the offsets and the size difference to correct the coordinate value of the particular label of one of the two substrates; comparing the coordinate values of the particular labels of the two substrates so as to acquire a second group of offsets; and moving the substrate to the position compensated by the second group of the offsets.