Pattern inspecting and measuring device and program

The purpose of the present invention is to provide a pattern inspecting and measuring device that improves the reliability of inspection and measurement results by reducing the effect of noise or the like on inspections or measurements using an edge position extracted from image data obtained by ima...

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Bibliographische Detailangaben
Hauptverfasser:	SHINDO HIROYUKI, HIROI TAKASHI, TOYODA YASUTAKA, SHINODA SHINICHI, FUKUNAGA FUMIHIKO, NINOMIYA TAKU, MINAKAWA TSUYOSHI, YOSHIDA TAKEYUKI, YAMAMOTO TAKUMA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a pattern inspecting and measuring device that improves the reliability of inspection and measurement results by reducing the effect of noise or the like on inspections or measurements using an edge position extracted from image data obtained by imaging the pattern of an object to be inspected or measured. To this end, a pattern inspecting and measuring device, which inspects or measures a pattern to be inspected or measured by using an edge position extracted from image data obtained by imaging a pattern to be inspected or measured by using an edge extraction parameter, is characterized by generating the edge extraction parameter by using the image data and a reference pattern indicating the shape that is the reference for inspection or measurement.