Antenna cover and plasma generating device using same

The invention provides an antenna cover for maintaining the generating efficiency of plasma and reducing the influence of the consumption caused by the plasma, and a plasma generating device using the same. The antenna cover (30) protects a surface of an antenna (20) provided in a plasma chamber (12...

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Bibliographische Detailangaben
Hauptverfasser:	NINOMIYA SHIRO, SATO MASATERU
Format:	Patent
Sprache:	eng
Schlagworte:	ANTENNAS, i.e. RADIO AERIALS BASIC ELECTRIC ELEMENTS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	The invention provides an antenna cover for maintaining the generating efficiency of plasma and reducing the influence of the consumption caused by the plasma, and a plasma generating device using the same. The antenna cover (30) protects a surface of an antenna (20) provided in a plasma chamber (12) and emitting high frequency in the plasma chamber (12). In the antenna cover (30), the thickness of the antenna cover (30) in at least one direction among directions orthogonal to the surface of the antenna (20) is different according to a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover (30) decreases. In the antenna cover (30), the thickness of at least one direction may be changed along an extension direction of the antenna (20).