Radiation system and lithographic apparatus

A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source (50) configured to generate a plasma that emits radiation and debris, and a radiation collector (70) configured to direct collected radiation to a radiation beam emission aperture (60). A...

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Bibliographische Detailangaben
Hauptverfasser:	YEVGENYEVICH BANINE VADIM, MIHAILOVITCH KRIVTSUN VLADIMIR, VITALEVICH IVANOV VLADIMIR, ROELOF LOOPSTRA ERIK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source (50) configured to generate a plasma that emits radiation and debris, and a radiation collector (70) configured to direct collected radiation to a radiation beam emission aperture (60). A magnetic field generator (200) is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector (70).