Positioning device, control device and control method

The present invention relates to a positioning device, e.g. for use as a wafer stage, having a very stable temperature, a very low power consumption and a uniform temperature distribution. A long stroke stage (20) and a short stroke stage (50) are stacked upon each other. To initiate a movement of t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS, SPERLING FRANK BERNHARD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a positioning device, e.g. for use as a wafer stage, having a very stable temperature, a very low power consumption and a uniform temperature distribution. A long stroke stage (20) and a short stroke stage (50) are stacked upon each other. To initiate a movement of the long stroke stage (20) and the short stroke stage (50) in a desired movement direction (M1) the long stroke stage (20) is first moved in an opposite direction (M2) that is opposite to the desired movement direction (M1) and/or the short stroke stage (50) is first moved in the desired movement direction (M1) for a predetermined time interval and for a distance smaller than the distance (d) between a ferromagnetic center stroke element (52) and the closest one of two actuators (30, 40) in a stationary state of the long stroke stage (20). Subsequently, the long stroke stage (20) is moved in the desired movement direction (M1).