Analytical method for measuring impurity content in tin sample

The invention belongs to the technical field of test analysis and discloses an analytical method for measuring impurity content in a tin sample. The analytical method for measuring the impurity content in the tin sample is used for measuring such impurities as Fe, Cu, Ni, Cr, Ti, Mg, Al and Mn; the...

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Hauptverfasser: ZHOU LI, ZHAO HUIFENG, WU QINGJIAN, LI XIAOGUI, LYU HAO, WANG YEXING
Format: Patent
Sprache:eng
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Zusammenfassung:The invention belongs to the technical field of test analysis and discloses an analytical method for measuring impurity content in a tin sample. The analytical method for measuring the impurity content in the tin sample is used for measuring such impurities as Fe, Cu, Ni, Cr, Ti, Mg, Al and Mn; the analytical method comprises the following steps: firstly, dissolving the tin sample to be measured; secondly, preparing a blank solution and a standard solution; thirdly, measuring the standard solution by use of an inductively coupled plasma atomic emission spectrograph and establishing a standard working curve; and finally, measuring the blank solution and the test sample solution on the inductively coupled plasma atomic emission spectrograph and automatically calculating the percentage content of impurity elements in the tin sample by use of an instrument. The analytical method for measuring the impurity content in the tin sample is capable of precisely and accurately measuring the impurity elements in the tin sample, and is high in measuring speed, high in accuracy and precision, and good in stability.