Novel oximester fluorine compound, and photopolymerization initiator and photoresist composition comprising same

Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.

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Bibliographische Detailangaben
Hauptverfasser:	SHIN JONG-IL, AN KYOUNG-LYONG, LEE SANG-OH, CHOI A-NAM, SHIN SEUNG-RIM, PARK SOO-YOUL, MOON BONG-SEOK, JUN KUN, OH CHUN-RIM, SO IN-YOUNG
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.