Substrate liquid processing apparatus, and substrate liquid processing method
The invention provides a substrate liquid processing apparatus supplying processing liquid with accurate concentration on a substrate and a substrate liquid processing method. A substrate liquid processing apparatus includes a tank (102); a circulation line (104); a processing unit (16) connected to...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention provides a substrate liquid processing apparatus supplying processing liquid with accurate concentration on a substrate and a substrate liquid processing method. A substrate liquid processing apparatus includes a tank (102); a circulation line (104); a processing unit (16) connected to the circulation line through a branch line (112) and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism (206A, 206B, 208B) configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device (212 (or 212')) configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device (4) configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid. |
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