APPARATUS FOR TREATING SUBSTRATE

The invention relates to an apparatus for treating a substrate, in particular to an apparatus for treating a substrate and executing coating, developing and baking procedures. The apparatus for treating the substrate according to the present invention includes: an index unit, a process treating unit...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SOO MIN HWANG, HYOUNG RAE NOH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention relates to an apparatus for treating a substrate, in particular to an apparatus for treating a substrate and executing coating, developing and baking procedures. The apparatus for treating the substrate according to the present invention includes: an index unit, a process treating unit and a first path unit. The apparatus of the invention can improve the production of the substrate through dispersion of the load of a transport robot arm, and can selectively execute the positive and negative developing procedures to increase the production of the substrate.