Vacuum acquisition device for EUV irradiation material test system and corresponding test method

The invention discloses a vacuum acquisition device for an EUV (Extreme Ultraviolet) irradiation material test system and a corresponding test method, wherein the test system comprises an EUV light source chamber (A), a collection mirror chamber (B) and a sample chamber (C); the vacuum acquisition d...

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Bibliographische Detailangaben
Hauptverfasser: CHEN JINXIN, WANG KUIBO, WU XIAOBIN, WANG YU, CUI HUIRONG, XIE WANLU
Format: Patent
Sprache:eng
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Zusammenfassung:The invention discloses a vacuum acquisition device for an EUV (Extreme Ultraviolet) irradiation material test system and a corresponding test method, wherein the test system comprises an EUV light source chamber (A), a collection mirror chamber (B) and a sample chamber (C); the vacuum acquisition device comprises a vacuum pump unit and a vacuum gauge unit that are respectively connected to each chamber, a first gate valve and a second gate valve (A3, B3) that are connected between the chambers, a first gas source and a second gas source (A4, B4) that are used for communicating the first gate valve and the second gate valve (A3, B3), as well as a gas analysis unit (C5) that is connected with the vacuum pump unit (B1) of the collection mirror chamber (B) by a valve. The invention can evacuate each part of the test system, effectively prevent pollutants from dispersing from the EUV light source chamber and the sample chamber to the collection mirror chamber, and can measure the gas components in the sample chamber and the partial pressure when the vacuum pressure is unmatched.