Ceramic heater for semiconductor manufacturing device

The invention provides a ceramic heater capable of realizing uniform temperature distribution on the whole surface of a wafer-carrying surface. The ceramic heater (10) is provided with a circular-plate-shaped ceramic substrate (1) and a cylindrical support body (3) connected to backside (1b) at an o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MIKUMO AKIRA, NATSUHARA MASUHIRO, KIMURA KOICHI
Format: Patent
Sprache:eng
Schlagworte:
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