Cleaning method for removing binder on surface of bonding sheet obtained after silicon wafer back metal deposition process is conducted
The invention provides a cleaning method for removing a binder on the surface of a bonding sheet obtained after the silicon wafer back metal deposition process is conducted. The method includes the following steps that S1, an organic solvent is used for soaking a part; S2, an alkaline solution is us...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!