Polishing pad and method for manufacturing same
According to the present invention, the method for manufacturing a polishing pad by mixing a polishing layer forming material and solidifying the material through a chemical reaction includes: a step of forming micro organic particles by pulverizing an organic material using a physical method; a ste...
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| creator | AHN BONG-SU KIM SEUNG-GEUN SEO JANG-WON SONG KEEON LEE SANG-MOK KANG HAK-SU JANG YOUNG-JUN CHOO JEONG-SEON JEONG JIN-SU KONG GYOUNG-PYO |
| description | According to the present invention, the method for manufacturing a polishing pad by mixing a polishing layer forming material and solidifying the material through a chemical reaction includes: a step of forming micro organic particles by pulverizing an organic material using a physical method; a step of mixing the micro organic particles formed in the above step with the polishing layer forming material; a step of forming gaseous pores by mixing the mixture obtained in the above step with a pore size-controllable inert gas, a capsule-type foaming agent, or a chemical foaming agent; a step of producing a polishing layer by gelating and curing the mixture obtained in the above step; and a step of distributing the pores through the opening of the gaseous pores on a surface by processing the polishing layer. |
| format | Patent |
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KONG GYOUNG-PYO</creatorcontrib><description>According to the present invention, the method for manufacturing a polishing pad by mixing a polishing layer forming material and solidifying the material through a chemical reaction includes: a step of forming micro organic particles by pulverizing an organic material using a physical method; a step of mixing the micro organic particles formed in the above step with the polishing layer forming material; a step of forming gaseous pores by mixing the mixture obtained in the above step with a pore size-controllable inert gas, a capsule-type foaming agent, or a chemical foaming agent; a step of producing a polishing layer by gelating and curing the mixture obtained in the above step; and a step of distributing the pores through the opening of the gaseous pores on a surface by processing the polishing layer.</description><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; 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a step of mixing the micro organic particles formed in the above step with the polishing layer forming material; a step of forming gaseous pores by mixing the mixture obtained in the above step with a pore size-controllable inert gas, a capsule-type foaming agent, or a chemical foaming agent; a step of producing a polishing layer by gelating and curing the mixture obtained in the above step; and a step of distributing the pores through the opening of the gaseous pores on a surface by processing the polishing layer.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING |
| title | Polishing pad and method for manufacturing same |
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