Process for processing surface plasmon polariton coupled nano array based on scallop effect

The invention discloses a method for preparing a surface plasmon polariton coupled nano array. The method comprises the following steps: performing deep reactive ion etching on a substrate by adopting a nano-scale etching mask which is manufactured by electron beam exposure, and then performing meta...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WU WENGANG, CHEN ZHUOJIE, MA PENGCHENG, FAN JIAORONG
Format:	Patent
Sprache:	eng
Schlagworte:	MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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